Effects of first rapid thermal annealing temperature on Co silicide formation

• Main Authors: Peng, H.J., Shen, Z.X., Lim, E.H., Lai, C.W., Liu, R., Wee, A.T.S., Sameer, A., Dai, J.Y., Zhang, B.C., Zheng, J.Z.
• Other Authors: INSTITUTE OF ENGINEERING SCIENCE
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/116312
• Institution: National University of Singapore

10.1016/S0038-1101(03)00008-X