Effects of first rapid thermal annealing temperature on Co silicide formation
10.1016/S0038-1101(03)00008-X
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Main Authors: | Peng, H.J., Shen, Z.X., Lim, E.H., Lai, C.W., Liu, R., Wee, A.T.S., Sameer, A., Dai, J.Y., Zhang, B.C., Zheng, J.Z. |
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Other Authors: | INSTITUTE OF ENGINEERING SCIENCE |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/116312 |
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Institution: | National University of Singapore |
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