Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing

10.1109/SPI.2002.258308

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Bibliographic Details
Main Authors:	Loh, S.W., Zhang, D.H., Liu, R., Li, C.Y., Wee, A.T.S.
Other Authors:	INSTITUTE OF ENGINEERING SCIENCE
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/116746
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Institution:	National University of Singapore

Description
Summary:	10.1109/SPI.2002.258308

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