Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing

10.1109/SPI.2002.258308

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Main Authors: Loh, S.W., Zhang, D.H., Liu, R., Li, C.Y., Wee, A.T.S.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116746
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1167462015-01-26T23:49:04Z Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. INSTITUTE OF ENGINEERING SCIENCE PHYSICS 10.1109/SPI.2002.258308 Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI 173-176 2014-12-12T07:53:37Z 2014-12-12T07:53:37Z 2002 Conference Paper Loh, S.W.,Zhang, D.H.,Liu, R.,Li, C.Y.,Wee, A.T.S. (2002). Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing. Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI : 173-176. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SPI.2002.258308" target="_blank">https://doi.org/10.1109/SPI.2002.258308</a> 0780398211 http://scholarbank.nus.edu.sg/handle/10635/116746 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/SPI.2002.258308
author2 INSTITUTE OF ENGINEERING SCIENCE
author_facet INSTITUTE OF ENGINEERING SCIENCE
Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
format Conference or Workshop Item
author Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
spellingShingle Loh, S.W.
Zhang, D.H.
Liu, R.
Li, C.Y.
Wee, A.T.S.
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
author_sort Loh, S.W.
title Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
title_short Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
title_full Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
title_fullStr Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
title_full_unstemmed Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
title_sort investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/116746
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