Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing
10.1109/SPI.2002.258308
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sg-nus-scholar.10635-1167462015-01-26T23:49:04Z Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. INSTITUTE OF ENGINEERING SCIENCE PHYSICS 10.1109/SPI.2002.258308 Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI 173-176 2014-12-12T07:53:37Z 2014-12-12T07:53:37Z 2002 Conference Paper Loh, S.W.,Zhang, D.H.,Liu, R.,Li, C.Y.,Wee, A.T.S. (2002). Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing. Proceedings - 6th IEEE Workshop on Signal Propagation on Interconnects, SPI : 173-176. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SPI.2002.258308" target="_blank">https://doi.org/10.1109/SPI.2002.258308</a> 0780398211 http://scholarbank.nus.edu.sg/handle/10635/116746 NOT_IN_WOS Scopus |
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10.1109/SPI.2002.258308 |
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INSTITUTE OF ENGINEERING SCIENCE |
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INSTITUTE OF ENGINEERING SCIENCE Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. |
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Conference or Workshop Item |
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Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. |
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Loh, S.W. Zhang, D.H. Liu, R. Li, C.Y. Wee, A.T.S. Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
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Loh, S.W. |
title |
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
title_short |
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
title_full |
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
title_fullStr |
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
title_full_unstemmed |
Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
title_sort |
investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/116746 |
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1681095221588262912 |