Should the Refractive Index at 633 nm Be Used to Characterize Silicon Nitride Films?

• Main Authors: HAMEIRI, ZIV, BOROJEVIC, NINO, MAI, LY, NANDAKUMAR, NAOMI, KIM, KYUNG, WINDERBAUM, SAUL
• 其他作者: SOLAR ENERGY RESEARCH INST OF S'PORE
• 格式: Conference or Workshop Item
• 出版: IEEE 2019
• 主題: Science & Technology; Technology; Physical Sciences; Energy & Fuels; Engineering, Electrical & Electronic; Physics, Applied; Engineering; Physics; CRYSTALLINE SILICON; PASSIVATION
• 在線閱讀: https://scholarbank.nus.edu.sg/handle/10635/155120

10.1109/PVSC.2016.7750187