Considerations for the nano aperture ion source: Geometrical design and electrical control
10.1063/1.5128657
Saved in:
Main Authors: | Jeroen A. van Kan, Rudy Pang, Tanmoy Basu, Yanxin Dou, Gokul, Nicolas Tarino, Jack Tregidga, Sangita Chaki Roy, Huei Ming Tan |
---|---|
Other Authors: | CENTRE FOR ADVANCED 2D MATERIALS |
Format: | Article |
Published: |
AIP Publishing
2021
|
Subjects: | |
Online Access: | https://scholarbank.nus.edu.sg/handle/10635/188023 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Ion beam lithography and nanofabrication: A review
by: Watt, F., et al.
Published: (2014) -
A multi-beam ion/electron spectra-microscope design
by: Khursheed, A.
Published: (2014) -
NANOFABRICATION USING OPTIMIZED PROTON BEAM WRITING AND MASKED ION LITHOGRAPHY
by: SARFRAZ QURESHI
Published: (2019) -
Perovskite-ion beam interactions : toward controllable light emission and lasing
by: Wang, Yue, et al.
Published: (2020) -
Localization measures for high-aperture wavefields based on pupil moments
by: Sheppard, C.J.R., et al.
Published: (2014)