Ab initio simulations of low-k and ultra low-k dielectric interconnects

Ab initio simulations of low-k and ultra low-k dielectric interconnects

Diffusion and Defect Data Pt.B: Solid State Phenomena

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Bibliographic Details
Main Authors: Tan, V.B.C., Dai, L., Yang, S.W., Chen, X.T., Wu, P.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Ab initio molecular dynamics
Diffusion barrier
Low-k dielectrics
Online Access:http://scholarbank.nus.edu.sg/handle/10635/51556
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Institution: National University of Singapore

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