An in-situ temperature measurement system for DUV lithography

An in-situ temperature measurement system for DUV lithography

10.1109/TIM.2003.815987

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Bibliographic Details
Main Authors: Tan, W.W., Li, R.F.Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
In-situ temperature measurement
LCSR test
Measurement accuracy
Out-of-contact fault
Post-exposure bake
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55034
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Institution: National University of Singapore

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