Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications

10.1149/1.2171827

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Bibliographic Details
Main Authors:	Lim, A.E.-J., Lee, R.T.P., Tung, C.H., Tripathy, S., Kwong, D.-L., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56098
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56098
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spelling	sg-nus-scholar.10635-560982023-10-26T07:43:13Z Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications Lim, A.E.-J. Lee, R.T.P. Tung, C.H. Tripathy, S. Kwong, D.-L. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2171827 Journal of the Electrochemical Society 153 4 G337-G340 JESOA 2014-06-17T02:50:42Z 2014-06-17T02:50:42Z 2006-04 Article Lim, A.E.-J., Lee, R.T.P., Tung, C.H., Tripathy, S., Kwong, D.-L., Yeo, Y.-C. (2006-04). Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications. Journal of the Electrochemical Society 153 (4) : G337-G340. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2171827 00134651 http://scholarbank.nus.edu.sg/handle/10635/56098 000235723600059 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.2171827
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lim, A.E.-J. Lee, R.T.P. Tung, C.H. Tripathy, S. Kwong, D.-L. Yeo, Y.-C.
format	Article
author	Lim, A.E.-J. Lee, R.T.P. Tung, C.H. Tripathy, S. Kwong, D.-L. Yeo, Y.-C.
spellingShingle	Lim, A.E.-J. Lee, R.T.P. Tung, C.H. Tripathy, S. Kwong, D.-L. Yeo, Y.-C. Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
author_sort	Lim, A.E.-J.
title	Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
title_short	Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
title_full	Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
title_fullStr	Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
title_full_unstemmed	Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications
title_sort	full silicidation of silicon gate electrodes using nickel-terbium alloy for mosfet applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56098
_version_	1781781110915596288

Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications

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