Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications

• Main Authors: Lim, A.E.-J., Lee, R.T.P., Tung, C.H., Tripathy, S., Kwong, D.-L., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/56098
• Institution: National University of Singapore

10.1149/1.2171827