Incorporation of tin in boron doped silicon for reduced deactivation of boron during post-laser-anneal rapid thermal processing

10.1063/1.2812565

Saved in:
Bibliographic Details
Main Authors: Liu, F., Tan, K.-M., Wang, X., Low, D.K.Y., Lai, D.M.Y., Lim, P.C., Samudra, G., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56306
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items