Does short wavelength lithography process degrade the integrity of thin gate oxide?

• Main Authors: Kim, S.J., Cho, B.J., Chong, P.F., Chor, E.F., Ang, C.H., Ling, C.H., Joo, M.S., Yeo, I.S.
• 其他作者: ELECTRICAL ENGINEERING
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/62059
• 機構: National University of Singapore

Microelectronics Reliability