The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding
10.1016/j.mseb.2008.09.028
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sg-nus-scholar.10635-647092023-10-29T21:30:33Z The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Dong, G. Chan, L. Srinivasan, M.P. PHYSICS CHEMICAL & BIOMOLECULAR ENGINEERING Activation/deactivation Defect End-of-range N co-implantation Transient enhanced diffusion 10.1016/j.mseb.2008.09.028 Materials Science and Engineering B: Solid-State Materials for Advanced Technology 154-155 1-3 43-48 MSBTE 2014-06-17T07:50:22Z 2014-06-17T07:50:22Z 2008-12-05 Article Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Dong, G., Chan, L., Srinivasan, M.P. (2008-12-05). The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 154-155 (1-3) : 43-48. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mseb.2008.09.028 09215107 http://scholarbank.nus.edu.sg/handle/10635/64709 000262187600009 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| topic |
Activation/deactivation Defect End-of-range N co-implantation Transient enhanced diffusion |
| spellingShingle |
Activation/deactivation Defect End-of-range N co-implantation Transient enhanced diffusion Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Dong, G. Chan, L. Srinivasan, M.P. The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| description |
10.1016/j.mseb.2008.09.028 |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Dong, G. Chan, L. Srinivasan, M.P. |
| format |
Article |
| author |
Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Dong, G. Chan, L. Srinivasan, M.P. |
| author_sort |
Yeong, S.H. |
| title |
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| title_short |
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| title_full |
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| title_fullStr |
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| title_full_unstemmed |
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| title_sort |
impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/64709 |
| _version_ |
1781782476047253504 |