The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding

The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding

10.1016/j.mseb.2008.09.028

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Bibliographic Details
Main Authors: Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Dong, G., Chan, L., Srinivasan, M.P.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Activation/deactivation
Defect
End-of-range
N co-implantation
Transient enhanced diffusion
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64709
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Institution: National University of Singapore

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