Understanding of boron junction stability in preamorphized silicon after optimized flash annealing

10.1149/1.2917901

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Main Authors: Yeong, S.H., Colombeau, B., Poon, C.H., Mok, K.R.C., See, A., Benistant, F., Tan, D.X.M., Pey, K.L., Ng, C.M., Chan, L., Srinivasan, M.P.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64768
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-647682023-10-26T20:42:45Z Understanding of boron junction stability in preamorphized silicon after optimized flash annealing Yeong, S.H. Colombeau, B. Poon, C.H. Mok, K.R.C. See, A. Benistant, F. Tan, D.X.M. Pey, K.L. Ng, C.M. Chan, L. Srinivasan, M.P. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1149/1.2917901 Journal of the Electrochemical Society 155 7 H508-H512 JESOA 2014-06-17T07:51:05Z 2014-06-17T07:51:05Z 2008 Article Yeong, S.H., Colombeau, B., Poon, C.H., Mok, K.R.C., See, A., Benistant, F., Tan, D.X.M., Pey, K.L., Ng, C.M., Chan, L., Srinivasan, M.P. (2008). Understanding of boron junction stability in preamorphized silicon after optimized flash annealing. Journal of the Electrochemical Society 155 (7) : H508-H512. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2917901 00134651 http://scholarbank.nus.edu.sg/handle/10635/64768 000256198900060 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.2917901
author2 CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet CHEMICAL & BIOMOLECULAR ENGINEERING
Yeong, S.H.
Colombeau, B.
Poon, C.H.
Mok, K.R.C.
See, A.
Benistant, F.
Tan, D.X.M.
Pey, K.L.
Ng, C.M.
Chan, L.
Srinivasan, M.P.
format Article
author Yeong, S.H.
Colombeau, B.
Poon, C.H.
Mok, K.R.C.
See, A.
Benistant, F.
Tan, D.X.M.
Pey, K.L.
Ng, C.M.
Chan, L.
Srinivasan, M.P.
spellingShingle Yeong, S.H.
Colombeau, B.
Poon, C.H.
Mok, K.R.C.
See, A.
Benistant, F.
Tan, D.X.M.
Pey, K.L.
Ng, C.M.
Chan, L.
Srinivasan, M.P.
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
author_sort Yeong, S.H.
title Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
title_short Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
title_full Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
title_fullStr Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
title_full_unstemmed Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
title_sort understanding of boron junction stability in preamorphized silicon after optimized flash annealing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/64768
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