Understanding of boron junction stability in preamorphized silicon after optimized flash annealing
10.1149/1.2917901
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sg-nus-scholar.10635-647682023-10-26T20:42:45Z Understanding of boron junction stability in preamorphized silicon after optimized flash annealing Yeong, S.H. Colombeau, B. Poon, C.H. Mok, K.R.C. See, A. Benistant, F. Tan, D.X.M. Pey, K.L. Ng, C.M. Chan, L. Srinivasan, M.P. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1149/1.2917901 Journal of the Electrochemical Society 155 7 H508-H512 JESOA 2014-06-17T07:51:05Z 2014-06-17T07:51:05Z 2008 Article Yeong, S.H., Colombeau, B., Poon, C.H., Mok, K.R.C., See, A., Benistant, F., Tan, D.X.M., Pey, K.L., Ng, C.M., Chan, L., Srinivasan, M.P. (2008). Understanding of boron junction stability in preamorphized silicon after optimized flash annealing. Journal of the Electrochemical Society 155 (7) : H508-H512. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2917901 00134651 http://scholarbank.nus.edu.sg/handle/10635/64768 000256198900060 Scopus |
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CHEMICAL & BIOMOLECULAR ENGINEERING |
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CHEMICAL & BIOMOLECULAR ENGINEERING Yeong, S.H. Colombeau, B. Poon, C.H. Mok, K.R.C. See, A. Benistant, F. Tan, D.X.M. Pey, K.L. Ng, C.M. Chan, L. Srinivasan, M.P. |
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Yeong, S.H. Colombeau, B. Poon, C.H. Mok, K.R.C. See, A. Benistant, F. Tan, D.X.M. Pey, K.L. Ng, C.M. Chan, L. Srinivasan, M.P. |
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Yeong, S.H. Colombeau, B. Poon, C.H. Mok, K.R.C. See, A. Benistant, F. Tan, D.X.M. Pey, K.L. Ng, C.M. Chan, L. Srinivasan, M.P. Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
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Yeong, S.H. |
title |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
title_short |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
title_full |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
title_fullStr |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
title_full_unstemmed |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
title_sort |
understanding of boron junction stability in preamorphized silicon after optimized flash annealing |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/64768 |
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1781782488555716608 |