Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology

• Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
• Other Authors: MECHANICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Diffraction coefficients; Geometrical theory of diffraction; Optical proximity correction; Phase shift masks; Time-domain finite-difference algorithm
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/73819
• Institution: National University of Singapore

10.1117/12.536160