Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction

10.1149/1.1798191

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Main Authors: Ho, C.S., Pey, K.L., Tung, C.H., Zhang, B.C., Tee, K.C., Karunasiri, G., Chua, S.J.
其他作者: ELECTRICAL ENGINEERING
格式: Article
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/81331
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spelling sg-nus-scholar.10635-813312024-11-14T02:28:39Z Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction Ho, C.S. Pey, K.L. Tung, C.H. Zhang, B.C. Tee, K.C. Karunasiri, G. Chua, S.J. ELECTRICAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1798191 Electrochemical and Solid-State Letters 7 11 H49-H51 ESLEF 2014-10-07T03:07:09Z 2014-10-07T03:07:09Z 2004 Article Ho, C.S., Pey, K.L., Tung, C.H., Zhang, B.C., Tee, K.C., Karunasiri, G., Chua, S.J. (2004). Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction. Electrochemical and Solid-State Letters 7 (11) : H49-H51. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1798191 10990062 http://scholarbank.nus.edu.sg/handle/10635/81331 000228539900049 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.1798191
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Ho, C.S.
Pey, K.L.
Tung, C.H.
Zhang, B.C.
Tee, K.C.
Karunasiri, G.
Chua, S.J.
format Article
author Ho, C.S.
Pey, K.L.
Tung, C.H.
Zhang, B.C.
Tee, K.C.
Karunasiri, G.
Chua, S.J.
spellingShingle Ho, C.S.
Pey, K.L.
Tung, C.H.
Zhang, B.C.
Tee, K.C.
Karunasiri, G.
Chua, S.J.
Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
author_sort Ho, C.S.
title Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
title_short Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
title_full Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
title_fullStr Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
title_full_unstemmed Uniform void-free epitaxial CoSi 2 formation on STI bounded narrow Si(lOO) lines by template layer stress reduction
title_sort uniform void-free epitaxial cosi 2 formation on sti bounded narrow si(loo) lines by template layer stress reduction
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81331
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