Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices

Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices

Technical Digest - International Electron Devices Meeting

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Main Authors: Yu, H.Y., Kang, J.F., Chen, J.D., Ren, C., Hou, Y.T., Whang, S.J., Li, M.-F., Chan, D.S.H., Bera, K.L., Tung, C.H., Du, A., Kwong, D.-L.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81781
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-817812015-01-09T08:49:40Z Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices Yu, H.Y. Kang, J.F. Chen, J.D. Ren, C. Hou, Y.T. Whang, S.J. Li, M.-F. Chan, D.S.H. Bera, K.L. Tung, C.H. Du, A. Kwong, D.-L. ELECTRICAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING Technical Digest - International Electron Devices Meeting 99-102 TDIMD 2014-10-07T03:11:59Z 2014-10-07T03:11:59Z 2003 Conference Paper Yu, H.Y.,Kang, J.F.,Chen, J.D.,Ren, C.,Hou, Y.T.,Whang, S.J.,Li, M.-F.,Chan, D.S.H.,Bera, K.L.,Tung, C.H.,Du, A.,Kwong, D.-L. (2003). Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices. Technical Digest - International Electron Devices Meeting : 99-102. ScholarBank@NUS Repository. 01631918 http://scholarbank.nus.edu.sg/handle/10635/81781 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Technical Digest - International Electron Devices Meeting
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Yu, H.Y.
Kang, J.F.
Chen, J.D.
Ren, C.
Hou, Y.T.
Whang, S.J.
Li, M.-F.
Chan, D.S.H.
Bera, K.L.
Tung, C.H.
Du, A.
Kwong, D.-L.
format Conference or Workshop Item
author Yu, H.Y.
Kang, J.F.
Chen, J.D.
Ren, C.
Hou, Y.T.
Whang, S.J.
Li, M.-F.
Chan, D.S.H.
Bera, K.L.
Tung, C.H.
Du, A.
Kwong, D.-L.
spellingShingle Yu, H.Y.
Kang, J.F.
Chen, J.D.
Ren, C.
Hou, Y.T.
Whang, S.J.
Li, M.-F.
Chan, D.S.H.
Bera, K.L.
Tung, C.H.
Du, A.
Kwong, D.-L.
Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
author_sort Yu, H.Y.
title Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
title_short Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
title_full Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
title_fullStr Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
title_full_unstemmed Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices
title_sort thermally robust high quality hfn/hfo 2 gate stack for advanced cmos devices
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81781
_version_ 1681089133671350272

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