Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices

• Main Authors: Yu, H.Y., Kang, J.F., Chen, J.D., Ren, C., Hou, Y.T., Whang, S.J., Li, M.-F., Chan, D.S.H., Bera, K.L., Tung, C.H., Du, A., Kwong, D.-L.
• Other Authors: ELECTRICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/81781
• Institution: National University of Singapore

Technical Digest - International Electron Devices Meeting