Influence of reductant and germanium concentration on the growth and stress development of germanium nanocrystals in silicon oxide matrix
10.1088/0957-4484/18/6/065302
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Main Authors: | Chew, H.G., Zheng, F., Choi, W.K., Chim, W.K., Foo, Y.L., Fitzgerald, E.A. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82536 |
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Institution: | National University of Singapore |
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