Investigation of electrical properties of furnace grown gate oxide on strained-Si

10.1016/j.tsf.2004.05.028

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Bibliographic Details
Main Authors:	Bera, L.K., Mathew, S., Balasubramanian, N., Leitz, C., Braithwaite, G., Singaporewala, F., Yap, J., Carlin, J., Langdo, T., Lochtefeld, T., Currie, M., Hammond, R., Fiorenza, J., Badawi, H., Bulsara, M.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Gate oxide Ge-diffusion SiGe Strained-Si
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82569
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82569
record_format	dspace
spelling	sg-nus-scholar.10635-825692023-10-27T08:31:14Z Investigation of electrical properties of furnace grown gate oxide on strained-Si Bera, L.K. Mathew, S. Balasubramanian, N. Leitz, C. Braithwaite, G. Singaporewala, F. Yap, J. Carlin, J. Langdo, T. Lochtefeld, T. Currie, M. Hammond, R. Fiorenza, J. Badawi, H. Bulsara, M. ELECTRICAL & COMPUTER ENGINEERING Gate oxide Ge-diffusion SiGe Strained-Si 10.1016/j.tsf.2004.05.028 Thin Solid Films 462-463 SPEC. ISS. 85-89 THSFA 2014-10-07T04:30:55Z 2014-10-07T04:30:55Z 2004-09 Article Bera, L.K., Mathew, S., Balasubramanian, N., Leitz, C., Braithwaite, G., Singaporewala, F., Yap, J., Carlin, J., Langdo, T., Lochtefeld, T., Currie, M., Hammond, R., Fiorenza, J., Badawi, H., Bulsara, M. (2004-09). Investigation of electrical properties of furnace grown gate oxide on strained-Si. Thin Solid Films 462-463 (SPEC. ISS.) : 85-89. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.05.028 00406090 http://scholarbank.nus.edu.sg/handle/10635/82569 000223812800019 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Gate oxide Ge-diffusion SiGe Strained-Si
spellingShingle	Gate oxide Ge-diffusion SiGe Strained-Si Bera, L.K. Mathew, S. Balasubramanian, N. Leitz, C. Braithwaite, G. Singaporewala, F. Yap, J. Carlin, J. Langdo, T. Lochtefeld, T. Currie, M. Hammond, R. Fiorenza, J. Badawi, H. Bulsara, M. Investigation of electrical properties of furnace grown gate oxide on strained-Si
description	10.1016/j.tsf.2004.05.028
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Bera, L.K. Mathew, S. Balasubramanian, N. Leitz, C. Braithwaite, G. Singaporewala, F. Yap, J. Carlin, J. Langdo, T. Lochtefeld, T. Currie, M. Hammond, R. Fiorenza, J. Badawi, H. Bulsara, M.
format	Article
author	Bera, L.K. Mathew, S. Balasubramanian, N. Leitz, C. Braithwaite, G. Singaporewala, F. Yap, J. Carlin, J. Langdo, T. Lochtefeld, T. Currie, M. Hammond, R. Fiorenza, J. Badawi, H. Bulsara, M.
author_sort	Bera, L.K.
title	Investigation of electrical properties of furnace grown gate oxide on strained-Si
title_short	Investigation of electrical properties of furnace grown gate oxide on strained-Si
title_full	Investigation of electrical properties of furnace grown gate oxide on strained-Si
title_fullStr	Investigation of electrical properties of furnace grown gate oxide on strained-Si
title_full_unstemmed	Investigation of electrical properties of furnace grown gate oxide on strained-Si
title_sort	investigation of electrical properties of furnace grown gate oxide on strained-si
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82569
_version_	1781784172801556480

Investigation of electrical properties of furnace grown gate oxide on strained-Si

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