Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs

10.1109/LED.2008.2001029

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Bibliographic Details
Main Authors:	Liu, F., Wong, H.-S., Ang, K.-W., Zhu, M., Wang, X., Lai, D.M.-Y., Lim, P.-C., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Germanium (Ge) enrichment Laser annealing (LA) Strained transistor
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82604
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82604
record_format	dspace
spelling	sg-nus-scholar.10635-826042023-10-29T22:26:03Z Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Germanium (Ge) enrichment Laser annealing (LA) Strained transistor 10.1109/LED.2008.2001029 IEEE Electron Device Letters 29 8 885-888 EDLED 2014-10-07T04:31:20Z 2014-10-07T04:31:20Z 2008-08 Article Liu, F., Wong, H.-S., Ang, K.-W., Zhu, M., Wang, X., Lai, D.M.-Y., Lim, P.-C., Yeo, Y.-C. (2008-08). Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs. IEEE Electron Device Letters 29 (8) : 885-888. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2008.2001029 07413106 http://scholarbank.nus.edu.sg/handle/10635/82604 000258096000020 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Germanium (Ge) enrichment Laser annealing (LA) Strained transistor
spellingShingle	Germanium (Ge) enrichment Laser annealing (LA) Strained transistor Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Yeo, Y.-C. Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
description	10.1109/LED.2008.2001029
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Yeo, Y.-C.
format	Article
author	Liu, F. Wong, H.-S. Ang, K.-W. Zhu, M. Wang, X. Lai, D.M.-Y. Lim, P.-C. Yeo, Y.-C.
author_sort	Liu, F.
title	Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
title_short	Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
title_full	Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
title_fullStr	Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
title_full_unstemmed	Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs
title_sort	laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pmosfets
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82604
_version_	1781784181158707200

Laser annealing of amorphous germanium on silicon-germanium source/drain for strain and performance enhancement in pMOSFETs

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