Progress in surface passivation of heavily doped n-type and p-type silicon by plasma-deposited AlO x/SiNx dielectric stacks
10.1109/JPHOTOV.2013.2270350
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Main Authors: | Duttagupta, S., Ma, F.-J., Lin, S.F., Mueller, T., Aberle, A.G., Hoex, B. |
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Other Authors: | SOLAR ENERGY RESEARCH INST OF S'PORE |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82937 |
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Institution: | National University of Singapore |
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