Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers

Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers

10.1116/1.2137329

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Bibliographic Details
Main Authors: Bera, M.K., Chakraborty, S., Das, R., Dalapati, G.K., Chattopadhyay, S., Samanta, S.K., Yoo, W.J., Chakraborty, A.K., Butenko, Y., Šiller, L., Hunt, M.R.C., Saha, S., Maiti, C.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82967
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Institution: National University of Singapore

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