Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications

10.1109/LED.2004.841469

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Bibliographic Details
Main Authors:	Ren, C., Yu, H.Y., Wang, X.P., Ma, H.H.H., Chan, D.S.H., Li, M.-F., Yeo, Y.-C., Tung, C.H., Balasubramanian, N., Huan, A.C.H., Pan, J.S., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	CMOS Dual-metal gate N-type TaTbxN Thermal stability
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83197
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83197
record_format	dspace
spelling	sg-nus-scholar.10635-831972023-10-30T07:12:58Z Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications Ren, C. Yu, H.Y. Wang, X.P. Ma, H.H.H. Chan, D.S.H. Li, M.-F. Yeo, Y.-C. Tung, C.H. Balasubramanian, N. Huan, A.C.H. Pan, J.S. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CMOS Dual-metal gate N-type TaTbxN Thermal stability 10.1109/LED.2004.841469 IEEE Electron Device Letters 26 2 75-77 EDLED 2014-10-07T04:38:26Z 2014-10-07T04:38:26Z 2005-02 Article Ren, C., Yu, H.Y., Wang, X.P., Ma, H.H.H., Chan, D.S.H., Li, M.-F., Yeo, Y.-C., Tung, C.H., Balasubramanian, N., Huan, A.C.H., Pan, J.S., Kwong, D.-L. (2005-02). Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications. IEEE Electron Device Letters 26 (2) : 75-77. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.841469 07413106 http://scholarbank.nus.edu.sg/handle/10635/83197 000226479100009 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	CMOS Dual-metal gate N-type TaTbxN Thermal stability
spellingShingle	CMOS Dual-metal gate N-type TaTbxN Thermal stability Ren, C. Yu, H.Y. Wang, X.P. Ma, H.H.H. Chan, D.S.H. Li, M.-F. Yeo, Y.-C. Tung, C.H. Balasubramanian, N. Huan, A.C.H. Pan, J.S. Kwong, D.-L. Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
description	10.1109/LED.2004.841469
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ren, C. Yu, H.Y. Wang, X.P. Ma, H.H.H. Chan, D.S.H. Li, M.-F. Yeo, Y.-C. Tung, C.H. Balasubramanian, N. Huan, A.C.H. Pan, J.S. Kwong, D.-L.
format	Article
author	Ren, C. Yu, H.Y. Wang, X.P. Ma, H.H.H. Chan, D.S.H. Li, M.-F. Yeo, Y.-C. Tung, C.H. Balasubramanian, N. Huan, A.C.H. Pan, J.S. Kwong, D.-L.
author_sort	Ren, C.
title	Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
title_short	Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
title_full	Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
title_fullStr	Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
title_full_unstemmed	Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications
title_sort	thermally robust tatbxn metal gate electrode for n-mosfets applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83197
_version_	1781784325504630784

Thermally robust TaTbxN metal gate electrode for n-MOSFETs applications

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