A novel surface passivation process for HfO 2 Ge MOSFETs

10.1109/DRC.2004.1367762

Saved in:

Bibliographic Details
Main Authors:	Wu, N., Zhang, Q., Zhu, C., Chan, D.S.H., Li, M.F., Balasubramanian, N., Du, A.Y., Chin, A., Sin, J.K.O., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83406
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-83406
record_format	dspace
spelling	sg-nus-scholar.10635-834062015-01-11T22:45:43Z A novel surface passivation process for HfO 2 Ge MOSFETs Wu, N. Zhang, Q. Zhu, C. Chan, D.S.H. Li, M.F. Balasubramanian, N. Du, A.Y. Chin, A. Sin, J.K.O. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/DRC.2004.1367762 Device Research Conference - Conference Digest, DRC 19-20 2014-10-07T04:40:53Z 2014-10-07T04:40:53Z 2004 Conference Paper Wu, N.,Zhang, Q.,Zhu, C.,Chan, D.S.H.,Li, M.F.,Balasubramanian, N.,Du, A.Y.,Chin, A.,Sin, J.K.O.,Kwong, D.-L. (2004). A novel surface passivation process for HfO 2 Ge MOSFETs. Device Research Conference - Conference Digest, DRC : 19-20. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/DRC.2004.1367762" target="_blank">https://doi.org/10.1109/DRC.2004.1367762</a> 0780382846 15483770 http://scholarbank.nus.edu.sg/handle/10635/83406 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/DRC.2004.1367762
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wu, N. Zhang, Q. Zhu, C. Chan, D.S.H. Li, M.F. Balasubramanian, N. Du, A.Y. Chin, A. Sin, J.K.O. Kwong, D.-L.
format	Conference or Workshop Item
author	Wu, N. Zhang, Q. Zhu, C. Chan, D.S.H. Li, M.F. Balasubramanian, N. Du, A.Y. Chin, A. Sin, J.K.O. Kwong, D.-L.
spellingShingle	Wu, N. Zhang, Q. Zhu, C. Chan, D.S.H. Li, M.F. Balasubramanian, N. Du, A.Y. Chin, A. Sin, J.K.O. Kwong, D.-L. A novel surface passivation process for HfO 2 Ge MOSFETs
author_sort	Wu, N.
title	A novel surface passivation process for HfO 2 Ge MOSFETs
title_short	A novel surface passivation process for HfO 2 Ge MOSFETs
title_full	A novel surface passivation process for HfO 2 Ge MOSFETs
title_fullStr	A novel surface passivation process for HfO 2 Ge MOSFETs
title_full_unstemmed	A novel surface passivation process for HfO 2 Ge MOSFETs
title_sort	novel surface passivation process for hfo 2 ge mosfets
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83406
_version_	1681089430003122176

A novel surface passivation process for HfO 2 Ge MOSFETs

Similar Items