Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)

10.1109/IEDM.2013.6724699

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Main Authors: Cheng, R., Liu, B., Guo, P., Yang, Y., Zhou, Q., Gong, X., Dong, Y., Tong, Y., Bourdelle, K., Daval, N., Delprat, D., Nguyen, B.-Y., Augendre, E., Yeo, Y.-C.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/83499
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機構: National University of Singapore
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spelling sg-nus-scholar.10635-834992024-11-11T21:23:09Z Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5) Cheng, R. Liu, B. Guo, P. Yang, Y. Zhou, Q. Gong, X. Dong, Y. Tong, Y. Bourdelle, K. Daval, N. Delprat, D. Nguyen, B.-Y. Augendre, E. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IEDM.2013.6724699 Technical Digest - International Electron Devices Meeting, IEDM 26.6.1-26.6.4 TDIMD 2014-10-07T04:41:55Z 2014-10-07T04:41:55Z 2013 Conference Paper Cheng, R.,Liu, B.,Guo, P.,Yang, Y.,Zhou, Q.,Gong, X.,Dong, Y.,Tong, Y.,Bourdelle, K.,Daval, N.,Delprat, D.,Nguyen, B.-Y.,Augendre, E.,Yeo, Y.-C. (2013). Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5). Technical Digest - International Electron Devices Meeting, IEDM : 26.6.1-26.6.4. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IEDM.2013.6724699" target="_blank">https://doi.org/10.1109/IEDM.2013.6724699</a> 9781479923076 01631918 http://scholarbank.nus.edu.sg/handle/10635/83499 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/IEDM.2013.6724699
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Cheng, R.
Liu, B.
Guo, P.
Yang, Y.
Zhou, Q.
Gong, X.
Dong, Y.
Tong, Y.
Bourdelle, K.
Daval, N.
Delprat, D.
Nguyen, B.-Y.
Augendre, E.
Yeo, Y.-C.
format Conference or Workshop Item
author Cheng, R.
Liu, B.
Guo, P.
Yang, Y.
Zhou, Q.
Gong, X.
Dong, Y.
Tong, Y.
Bourdelle, K.
Daval, N.
Delprat, D.
Nguyen, B.-Y.
Augendre, E.
Yeo, Y.-C.
spellingShingle Cheng, R.
Liu, B.
Guo, P.
Yang, Y.
Zhou, Q.
Gong, X.
Dong, Y.
Tong, Y.
Bourdelle, K.
Daval, N.
Delprat, D.
Nguyen, B.-Y.
Augendre, E.
Yeo, Y.-C.
Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
author_sort Cheng, R.
title Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
title_short Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
title_full Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
title_fullStr Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
title_full_unstemmed Asymetrically strained high performance Germanium gate-all-around nanowire p-FETs featuring 3.5 nm wire width and contractible phase change liner stressor (Ge2Sb2Te5)
title_sort asymetrically strained high performance germanium gate-all-around nanowire p-fets featuring 3.5 nm wire width and contractible phase change liner stressor (ge2sb2te5)
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83499
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