High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric

Digest of Technical Papers - Symposium on VLSI Technology

Saved in:
Bibliographic Details
Main Authors: Yu, X., Zhu, C., Wang, X.P., Li, M.F., Chin, A., Du, A.Y., Wang, W.D., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83780
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-83780
record_format dspace
spelling sg-nus-scholar.10635-837802015-01-09T09:22:30Z High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric Yu, X. Zhu, C. Wang, X.P. Li, M.F. Chin, A. Du, A.Y. Wang, W.D. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Digest of Technical Papers - Symposium on VLSI Technology 110-111 DTPTE 2014-10-07T04:45:06Z 2014-10-07T04:45:06Z 2004 Conference Paper Yu, X.,Zhu, C.,Wang, X.P.,Li, M.F.,Chin, A.,Du, A.Y.,Wang, W.D.,Kwong, D.-L. (2004). High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric. Digest of Technical Papers - Symposium on VLSI Technology : 110-111. ScholarBank@NUS Repository. 07431562 http://scholarbank.nus.edu.sg/handle/10635/83780 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Digest of Technical Papers - Symposium on VLSI Technology
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yu, X.
Zhu, C.
Wang, X.P.
Li, M.F.
Chin, A.
Du, A.Y.
Wang, W.D.
Kwong, D.-L.
format Conference or Workshop Item
author Yu, X.
Zhu, C.
Wang, X.P.
Li, M.F.
Chin, A.
Du, A.Y.
Wang, W.D.
Kwong, D.-L.
spellingShingle Yu, X.
Zhu, C.
Wang, X.P.
Li, M.F.
Chin, A.
Du, A.Y.
Wang, W.D.
Kwong, D.-L.
High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
author_sort Yu, X.
title High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
title_short High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
title_full High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
title_fullStr High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
title_full_unstemmed High mobility and excellent electrical stability of MOSFETs using a novel HfTaO gate dielectric
title_sort high mobility and excellent electrical stability of mosfets using a novel hftao gate dielectric
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83780
_version_ 1681089498904002560