Robust HfN Metal Gate Electrode for Advanced MOS Devices Application

Robust HfN Metal Gate Electrode for Advanced MOS Devices Application

Digest of Technical Papers - Symposium on VLSI Technology

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Main Authors: Yu, H.Y., Lim, H.F., Chen, J.H., Li, M.F., Zhu, C.X., Kwong, D.-L., Tung, C.H., Bera, K.L., Leo, C.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84145
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-841452015-01-07T08:31:50Z Robust HfN Metal Gate Electrode for Advanced MOS Devices Application Yu, H.Y. Lim, H.F. Chen, J.H. Li, M.F. Zhu, C.X. Kwong, D.-L. Tung, C.H. Bera, K.L. Leo, C.J. ELECTRICAL & COMPUTER ENGINEERING Digest of Technical Papers - Symposium on VLSI Technology 151-152 DTPTE 2014-10-07T04:49:19Z 2014-10-07T04:49:19Z 2003 Conference Paper Yu, H.Y.,Lim, H.F.,Chen, J.H.,Li, M.F.,Zhu, C.X.,Kwong, D.-L.,Tung, C.H.,Bera, K.L.,Leo, C.J. (2003). Robust HfN Metal Gate Electrode for Advanced MOS Devices Application. Digest of Technical Papers - Symposium on VLSI Technology : 151-152. ScholarBank@NUS Repository. 07431562 http://scholarbank.nus.edu.sg/handle/10635/84145 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Digest of Technical Papers - Symposium on VLSI Technology
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yu, H.Y.
Lim, H.F.
Chen, J.H.
Li, M.F.
Zhu, C.X.
Kwong, D.-L.
Tung, C.H.
Bera, K.L.
Leo, C.J.
format Conference or Workshop Item
author Yu, H.Y.
Lim, H.F.
Chen, J.H.
Li, M.F.
Zhu, C.X.
Kwong, D.-L.
Tung, C.H.
Bera, K.L.
Leo, C.J.
spellingShingle Yu, H.Y.
Lim, H.F.
Chen, J.H.
Li, M.F.
Zhu, C.X.
Kwong, D.-L.
Tung, C.H.
Bera, K.L.
Leo, C.J.
Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
author_sort Yu, H.Y.
title Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
title_short Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
title_full Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
title_fullStr Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
title_full_unstemmed Robust HfN Metal Gate Electrode for Advanced MOS Devices Application
title_sort robust hfn metal gate electrode for advanced mos devices application
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84145
_version_ 1681089565050273792

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