Robust HfN Metal Gate Electrode for Advanced MOS Devices Application

• Main Authors: Yu, H.Y., Lim, H.F., Chen, J.H., Li, M.F., Zhu, C.X., Kwong, D.-L., Tung, C.H., Bera, K.L., Leo, C.J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84145
• Institution: National University of Singapore

Digest of Technical Papers - Symposium on VLSI Technology