Tunable Oxide-Bypassed VDMOS (OBVDMOS): Breaking the silicon limit for the second generation
IEEE International Symposium on Power Semiconductor Devices and ICs (ISPSD)
Saved in:
Main Authors: | Liang, Y.C., Yang, X., Samudra, G.S., Gan, K.P., Liu, Y. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84325 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Oxide-bypassed VDMOS (OBVDMOS): An alternative to superjunction high voltage MOS power devices
by: Liang, Y.C., et al.
Published: (2014) -
Tunable Oxide-Bypassed Trench Gate MOSFET: Breaking the Ideal Superjunction MOSFET Performance Line at Equal Column Width
by: Yang, X., et al.
Published: (2014) -
Poly Flanked VDMOS (PFVDMOS): A superior technology for superjunction devices
by: Gan, K.P., et al.
Published: (2014) -
A simple technology for superjunction device fabrication: Polyflanked VDMOSFET
by: Gan, K.P., et al.
Published: (2014) -
Design of superjunction power MOSFET devices using the gradient oxide-bypassed structure
by: Chen, Y., et al.
Published: (2014)