Effect of low fluence laser annealing on ultrathin Lu2 O3 high- k dielectric
10.1063/1.2771065
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Main Authors: | Darmawan, P., Lee, P.S., Setiawan, Y., Ma, J., Osipowicz, T. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96319 |
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Institution: | National University of Singapore |
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