Growth and band alignment of epitaxial Ni metal gate on crystalline LaAlO3 (001) dielectric film

10.1063/1.3153507

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Bibliographic Details
Main Authors: Mi, Y.Y., Wang, S.J., Zegenhagen, J., Chai, J.W., Pan, J.S., Huan, C.H.A., Feng, Y.P., Ong, C.K.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96751
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Institution: National University of Singapore

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