Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing

10.1149/1.1632873

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Bibliographic Details
Main Authors:	Chong, Y.F., Gossmann, H.-J.L., Pey, K.L., Thompson, M.O., Wee, A.T.S., Tung, C.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/97783
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-977832023-10-25T21:24:34Z Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing Chong, Y.F. Gossmann, H.-J.L. Pey, K.L. Thompson, M.O. Wee, A.T.S. Tung, C.H. PHYSICS 10.1149/1.1632873 Electrochemical and Solid-State Letters 7 2 G25-G27 ESLEF 2014-10-16T09:39:16Z 2014-10-16T09:39:16Z 2004 Article Chong, Y.F., Gossmann, H.-J.L., Pey, K.L., Thompson, M.O., Wee, A.T.S., Tung, C.H. (2004). Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing. Electrochemical and Solid-State Letters 7 (2) : G25-G27. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1632873 10990062 http://scholarbank.nus.edu.sg/handle/10635/97783 000188080600012 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1632873
author2	PHYSICS
author_facet	PHYSICS Chong, Y.F. Gossmann, H.-J.L. Pey, K.L. Thompson, M.O. Wee, A.T.S. Tung, C.H.
format	Article
author	Chong, Y.F. Gossmann, H.-J.L. Pey, K.L. Thompson, M.O. Wee, A.T.S. Tung, C.H.
spellingShingle	Chong, Y.F. Gossmann, H.-J.L. Pey, K.L. Thompson, M.O. Wee, A.T.S. Tung, C.H. Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
author_sort	Chong, Y.F.
title	Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
title_short	Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
title_full	Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
title_fullStr	Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
title_full_unstemmed	Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing
title_sort	reduction of polysilicon gate depletion effect in nmos devices using laser thermal processing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/97783
_version_	1781786740940341248

Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing

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