Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing

10.1149/1.1632873

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Bibliographic Details
Main Authors: Chong, Y.F., Gossmann, H.-J.L., Pey, K.L., Thompson, M.O., Wee, A.T.S., Tung, C.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/97783
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Institution: National University of Singapore

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