Development of nanocrystal memory devices
In this project, we have fabricated non-volatile memory (NVM) devices based on silicon nanocrystals. The nanocrystals are synthesized with very-low energy ion beam technique, and the size of the nanocrystals is ~ 4 nm as determined from TEM measurement. The fabrication of the memory devices is fu...
Saved in:
Main Author: | Chen, Tupei. |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Research Report |
Language: | English |
Published: |
2008
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/14231 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Study of Si-nanocrystals-based light-emitting devices
by: Chen, Tupei.
Published: (2009) -
Impact of programming mechanisms on the performance and reliability of nonvolatile memory devices based on Si nanocrystals
by: Ng, Chi Yung, et al.
Published: (2010) -
Synthesis, characterisation and device application of silicon nanocrystals
by: Ng, Chi Yung
Published: (2010) -
A comparative study on the dielectric functions of isolated Si nanocrystals and densely-stacked Si nanocrystal layer embedded in SiO2 synthesized with Si ion implantation
by: Ding, Liang, et al.
Published: (2011) -
Influence of nanocrystal distribution on electroluminescence from Si+-implanted SiO2 thin films
by: Ding, Liang, et al.
Published: (2011)