Fabrication of very high aspect micromold by SU-8 photolithography and electroforming

Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).

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Bibliographic Details
Main Author: Zhang, Jun
Other Authors: Chan Bee Eng, Mary
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:https://hdl.handle.net/10356/5524
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Institution: Nanyang Technological University

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