Design evaluation of microelectronics devices using focused ion beam technology

• Main Author: Yeo, Swee Hock.
• Other Authors: School of Mechanical and Aerospace Engineering
• Format: Research Report
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/7001
• Institution: Nanyang Technological University

With the advent of new technology, the circuitry lines within the IC chip are getting more and more higher in density. Miniaturisation of IC chips has forced many IC manufacturers to go to and beyond deep-sub-micron technology. The present IC technology still stands at less than 0.35 micron. But in...