Chemical and dielectrical characteristics of ultrathin oxides grown by atomic force microscopy and scanning electron beam

10.1063/1.1901814

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Bibliographic Details
Main Authors: Xie, X.N., Chung, H.J., Sow, C.H., Wee, A.T.S.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112582
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Institution: National University of Singapore

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