Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM
10.1049/el:20010390
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sg-nus-scholar.10635-1129672023-10-30T22:19:27Z Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM Teh, W.H. Koh, L.T. Chen, S.M. Xie, J. Li, C.Y. Foo, P.D. INSTITUTE OF MICROELECTRONICS 10.1049/el:20010390 Electronics Letters 37 10 660-661 ELLEA 2014-11-28T08:12:48Z 2014-11-28T08:12:48Z 2001-05-10 Article Teh, W.H., Koh, L.T., Chen, S.M., Xie, J., Li, C.Y., Foo, P.D. (2001-05-10). Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM. Electronics Letters 37 (10) : 660-661. ScholarBank@NUS Repository. https://doi.org/10.1049/el:20010390 00135194 http://scholarbank.nus.edu.sg/handle/10635/112967 000168899100036 Scopus |
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INSTITUTE OF MICROELECTRONICS |
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INSTITUTE OF MICROELECTRONICS Teh, W.H. Koh, L.T. Chen, S.M. Xie, J. Li, C.Y. Foo, P.D. |
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Teh, W.H. Koh, L.T. Chen, S.M. Xie, J. Li, C.Y. Foo, P.D. |
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Teh, W.H. Koh, L.T. Chen, S.M. Xie, J. Li, C.Y. Foo, P.D. Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
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Teh, W.H. |
title |
Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
title_short |
Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
title_full |
Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
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Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
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Evaluation of the performance of TaN diffusion barrier against copper diffusion using SIMS and AFM |
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evaluation of the performance of tan diffusion barrier against copper diffusion using sims and afm |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/112967 |
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