A new breakdown failure mechanism in HfO 2 gate dielectric
Annual Proceedings - Reliability Physics (Symposium)
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2014
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sg-nus-scholar.10635-1153642015-02-03T07:03:56Z A new breakdown failure mechanism in HfO 2 gate dielectric Ranjan, R. Pey, K.L. Tang, L.J. Tung, C.H. Groeseneken, G. Radhakrishnan, M.K. Kaczer, B. Degraeve, R. De Gendt, S. INSTITUTE OF MICROELECTRONICS Breakdown Dielectric-breakdown- induced epitaxy HfO 2 High-k gate dielectrics Annual Proceedings - Reliability Physics (Symposium) 347-352 ARLPB 2014-12-12T07:14:40Z 2014-12-12T07:14:40Z 2004 Conference Paper Ranjan, R.,Pey, K.L.,Tang, L.J.,Tung, C.H.,Groeseneken, G.,Radhakrishnan, M.K.,Kaczer, B.,Degraeve, R.,De Gendt, S. (2004). A new breakdown failure mechanism in HfO 2 gate dielectric. Annual Proceedings - Reliability Physics (Symposium) : 347-352. ScholarBank@NUS Repository. 00999512 http://scholarbank.nus.edu.sg/handle/10635/115364 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
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Singapore |
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| topic |
Breakdown Dielectric-breakdown- induced epitaxy HfO 2 High-k gate dielectrics |
| spellingShingle |
Breakdown Dielectric-breakdown- induced epitaxy HfO 2 High-k gate dielectrics Ranjan, R. Pey, K.L. Tang, L.J. Tung, C.H. Groeseneken, G. Radhakrishnan, M.K. Kaczer, B. Degraeve, R. De Gendt, S. A new breakdown failure mechanism in HfO 2 gate dielectric |
| description |
Annual Proceedings - Reliability Physics (Symposium) |
| author2 |
INSTITUTE OF MICROELECTRONICS |
| author_facet |
INSTITUTE OF MICROELECTRONICS Ranjan, R. Pey, K.L. Tang, L.J. Tung, C.H. Groeseneken, G. Radhakrishnan, M.K. Kaczer, B. Degraeve, R. De Gendt, S. |
| format |
Conference or Workshop Item |
| author |
Ranjan, R. Pey, K.L. Tang, L.J. Tung, C.H. Groeseneken, G. Radhakrishnan, M.K. Kaczer, B. Degraeve, R. De Gendt, S. |
| author_sort |
Ranjan, R. |
| title |
A new breakdown failure mechanism in HfO 2 gate dielectric |
| title_short |
A new breakdown failure mechanism in HfO 2 gate dielectric |
| title_full |
A new breakdown failure mechanism in HfO 2 gate dielectric |
| title_fullStr |
A new breakdown failure mechanism in HfO 2 gate dielectric |
| title_full_unstemmed |
A new breakdown failure mechanism in HfO 2 gate dielectric |
| title_sort |
new breakdown failure mechanism in hfo 2 gate dielectric |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/115364 |
| _version_ |
1681094972496936960 |