A new breakdown failure mechanism in HfO 2 gate dielectric
Annual Proceedings - Reliability Physics (Symposium)
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Main Authors: | Ranjan, R., Pey, K.L., Tang, L.J., Tung, C.H., Groeseneken, G., Radhakrishnan, M.K., Kaczer, B., Degraeve, R., De Gendt, S. |
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Other Authors: | INSTITUTE OF MICROELECTRONICS |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115364 |
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Institution: | National University of Singapore |
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