Gate dielectric degradation mechanism associated with DBIE evolution

Annual Proceedings - Reliability Physics (Symposium)

Saved in:
書目詳細資料
Main Authors: Pey, K.L., Ranjan, R., Tung, C.H., Tang, L.J., Lin, W.H., Radhakrishnan, M.K.
其他作者: INSTITUTE OF MICROELECTRONICS
格式: Conference or Workshop Item
出版: 2014
主題:
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/115429
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: National University of Singapore