Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing

Method to form narrow and wide shallow trench isolations with different trench depths to eliminate isolation oxide dishing

US6207534

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書目詳細資料
Main Authors:	CHAN, LAP, CHA, CHER LIANG, LEE, TECK KOON
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Patent
出版:	2012
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/32588
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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