Steep retrograde indium channel profiling for high performance nMOSFETs device fabrication
10.1117/12.405423
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Main Authors: | Ong, S.Y., Chor, E.F., Leung, Y.K., Lee, J., Li, W.S., See, A., Chan, L. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/50644 |
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Institution: | National University of Singapore |
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