Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

10.1063/1.1758297

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Bibliographic Details
Main Authors: Gupta, R., Yoo, W.J., Wang, Y., Tan, Z., Samudra, G., Lee, S., Chan, D.S.H., Loh, K.P., Bera, L.K., Balasubramanian, N., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82378
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Institution: National University of Singapore
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Summary:10.1063/1.1758297

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