Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

10.1063/1.1758297

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Bibliographic Details
Main Authors:	Gupta, R., Yoo, W.J., Wang, Y., Tan, Z., Samudra, G., Lee, S., Chan, D.S.H., Loh, K.P., Bera, L.K., Balasubramanian, N., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82378
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82378
record_format	dspace
spelling	sg-nus-scholar.10635-823782024-11-12T22:38:21Z Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CHEMISTRY 10.1063/1.1758297 Applied Physics Letters 84 21 4331-4333 APPLA 2014-10-07T04:28:39Z 2014-10-07T04:28:39Z 2004-05-24 Article Gupta, R., Yoo, W.J., Wang, Y., Tan, Z., Samudra, G., Lee, S., Chan, D.S.H., Loh, K.P., Bera, L.K., Balasubramanian, N., Kwong, D.-L. (2004-05-24). Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications. Applied Physics Letters 84 (21) : 4331-4333. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1758297 00036951 http://scholarbank.nus.edu.sg/handle/10635/82378 000221404700065 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1758297
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L.
format	Article
author	Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L.
spellingShingle	Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
author_sort	Gupta, R.
title	Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
title_short	Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
title_full	Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
title_fullStr	Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
title_full_unstemmed	Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
title_sort	formation of sige nanocrystals in hfo 2 using in situ chemical vapor deposition for memory applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82378
_version_	1821201487011774464

Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

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