Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications
10.1063/1.1758297
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sg-nus-scholar.10635-823782024-11-12T22:38:21Z Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CHEMISTRY 10.1063/1.1758297 Applied Physics Letters 84 21 4331-4333 APPLA 2014-10-07T04:28:39Z 2014-10-07T04:28:39Z 2004-05-24 Article Gupta, R., Yoo, W.J., Wang, Y., Tan, Z., Samudra, G., Lee, S., Chan, D.S.H., Loh, K.P., Bera, L.K., Balasubramanian, N., Kwong, D.-L. (2004-05-24). Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications. Applied Physics Letters 84 (21) : 4331-4333. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1758297 00036951 http://scholarbank.nus.edu.sg/handle/10635/82378 000221404700065 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
10.1063/1.1758297 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. |
| format |
Article |
| author |
Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. |
| spellingShingle |
Gupta, R. Yoo, W.J. Wang, Y. Tan, Z. Samudra, G. Lee, S. Chan, D.S.H. Loh, K.P. Bera, L.K. Balasubramanian, N. Kwong, D.-L. Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| author_sort |
Gupta, R. |
| title |
Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| title_short |
Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| title_full |
Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| title_fullStr |
Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| title_full_unstemmed |
Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications |
| title_sort |
formation of sige nanocrystals in hfo 2 using in situ chemical vapor deposition for memory applications |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/82378 |
| _version_ |
1821201487011774464 |