Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate

10.1109/IWJT.2007.4279953

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Bibliographic Details
Main Authors:	Gao, F., Li, R., Chi, D.Z., Balakumar, S., Lee, S.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83946
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83946
record_format	dspace
spelling	sg-nus-scholar.10635-839462024-11-10T21:13:30Z Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate Gao, F. Li, R. Chi, D.Z. Balakumar, S. Lee, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IWJT.2007.4279953 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007 77-80 2014-10-07T04:47:01Z 2014-10-07T04:47:01Z 2007 Conference Paper Gao, F.,Li, R.,Chi, D.Z.,Balakumar, S.,Lee, S.J. (2007). Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate. Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007 : 77-80. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IWJT.2007.4279953" target="_blank">https://doi.org/10.1109/IWJT.2007.4279953</a> 1424411033 http://scholarbank.nus.edu.sg/handle/10635/83946 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/IWJT.2007.4279953
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Gao, F. Li, R. Chi, D.Z. Balakumar, S. Lee, S.J.
format	Conference or Workshop Item
author	Gao, F. Li, R. Chi, D.Z. Balakumar, S. Lee, S.J.
spellingShingle	Gao, F. Li, R. Chi, D.Z. Balakumar, S. Lee, S.J. Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
author_sort	Gao, F.
title	Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
title_short	Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
title_full	Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
title_fullStr	Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
title_full_unstemmed	Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate
title_sort	metal-germanide schottky source/drain transistor with high-k/metal gate stack on ge and si0.05ge0.95/si substrate
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83946
_version_	1821217086012129280

Metal-germanide Schottky source/drain transistor with high-k/metal gate stack on Ge and Si0.05Ge0.95/Si substrate

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