Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain

Materials Research Society Symposium Proceedings

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Bibliographic Details
Main Authors:	Lee, R.T.P., Liow, T.-Y., Tan, K.-M., Ang, K.-W., Chui, K.-J., Guo, Q.-L., Samudra, G., Chi, D.-Z., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84113
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-84113
record_format	dspace
spelling	sg-nus-scholar.10635-841132015-01-08T19:13:22Z Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain Lee, R.T.P. Liow, T.-Y. Tan, K.-M. Ang, K.-W. Chui, K.-J. Guo, Q.-L. Samudra, G. Chi, D.-Z. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Materials Research Society Symposium Proceedings 913 59-64 MRSPD 2014-10-07T04:48:57Z 2014-10-07T04:48:57Z 2006 Conference Paper Lee, R.T.P.,Liow, T.-Y.,Tan, K.-M.,Ang, K.-W.,Chui, K.-J.,Guo, Q.-L.,Samudra, G.,Chi, D.-Z.,Yeo, Y.-C. (2006). Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain. Materials Research Society Symposium Proceedings 913 : 59-64. ScholarBank@NUS Repository. 1558998691 02729172 http://scholarbank.nus.edu.sg/handle/10635/84113 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Materials Research Society Symposium Proceedings
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lee, R.T.P. Liow, T.-Y. Tan, K.-M. Ang, K.-W. Chui, K.-J. Guo, Q.-L. Samudra, G. Chi, D.-Z. Yeo, Y.-C.
format	Conference or Workshop Item
author	Lee, R.T.P. Liow, T.-Y. Tan, K.-M. Ang, K.-W. Chui, K.-J. Guo, Q.-L. Samudra, G. Chi, D.-Z. Yeo, Y.-C.
spellingShingle	Lee, R.T.P. Liow, T.-Y. Tan, K.-M. Ang, K.-W. Chui, K.-J. Guo, Q.-L. Samudra, G. Chi, D.-Z. Yeo, Y.-C. Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
author_sort	Lee, R.T.P.
title	Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
title_short	Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
title_full	Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
title_fullStr	Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
title_full_unstemmed	Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain
title_sort	process-induced strained p-mosfet featuring nickel-platinum silicided source/drain
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84113
_version_	1681089559336583168

Process-induced strained P-MOSFET featuring nickel-platinum silicided source/drain

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